Beamfox Proximity ver. 1.8.0

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System requirements:

  • Microsoft Windows 7 or later, 64-bit.
  • OpenGL 3.2 support.
  • 8GB System RAM recommended.
  • Full HD Display recommended.

Supported electron-beam lithography tools:

  • Elionix: ELS-BODEN, ELS-ORCA, ELS-F150, ELS-F125, ELS-G100, ELS-S50EX, ELS-S50, ELS-HS50, ELS-7000GUI, ELS-7500EX, ELS-7500, ELS-7000, ELS-7800, ELS-7700.
  • Raith: All e-beam writers that support the CSF file format.
  • All e-beam writers that support layered GDS or grayscale TIFF images as input.
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Application Notes

Clearing dose

The only PEC-parameter that Beamfox Proximity cannot calculate automatically is the clearing dose, which depends on resist baking conditions, development temperature, etc. This application note describes how to measure it with a simple test exposure.

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Write field import

Beamfox Proximity provides control of write field placement and the writing order, and allows implementing advanced writing strategies, by importing user-defined YAML text files. This document explains the format used to generate write fields and alignment markers using YAML files.

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